About Ion Beam Milling
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Custom Thin Film Circuits
   Laser Diode Submounts
   Lange Couplers
   Filters: Low / High / Band Pass
   Band Reject / Notch RF / Microwave
   Tantalum Nitride Chip Resistors

Services
   Ion Etching
   Photolithography
   Dicing
   Wafer Processing

Standard Products
   Attenuators
   Planar Chip Inductors
   Heat Spreaders
   Microstrip Transmission Lines

News & Publication
   New Products, Developments

Contact
   Request for Quote
   Sales Phone Numbers / eMails

 Guidelines, Data & Spec Sheets
   Attenuator Design Kits
   Design Guidelines
   Fixed Attenuator Pads
   General Mask Guidline
   Guidelines Substrate
   Heat Spreader
   Lange Schematic
   Laser Diode
   Laser Diode Heat Spreaders
   Material and Metal Overview
   Transmission Lines Data Sheet
   Planar
   Planar Chip Inductors
   Print to Product
   Resistors
   Sub-Mount Data Sheet
   Transmission Lines Data Sheet

 
   Visit Us at IMS 2008
   
     June 15 - 20, 2008
      Visit Booth # 932

Call: 603.644.2326
Fax: 603.647.6889

1000 East Industrial Park Drive
Manchester, NH 03109

info@ionbeammilling.com

Ion Etching

In addition to our complete microfabrication laboratory we also provide our customers a highly anisotropic and nonselective etching process on a wide array of material.

• Same day turnaround on most applications.
• Up to 6" wafers.
• Up to 4" square substrates.
• In house or customer supplied photopatterned wafers or substrates can be ion milled within 1-3 days.

In addition to our complete microfabrication laboratory we also provide our customers a highly anisotropic and nonselective etching process on a wide array of materials. More Info...

Photo Pattern Processing

Microwave and millimeter-wave circuit fabrication begins with a design and layout of the circuit. Data is generated and used to run either a Pattern Generator or a Micronics Laser Writer.

The Pattern Generator or Laser Writer will generate the AR chrome or ion oxide on a glass photomask. The AR chrome photomask has about 950 Angstroms of chrome with about 150 Angstroms of chrome oxide. The chrome glass plate is coated with a positive acting photoresist which when exposed to either a laser or optical light source will render an image that matches the data supplied.

The image is then etched into the chrome and will match the actual circuit.

Our team of Engineers have met the custom requirements of the RF/Microwave industry for more than 25 years. Our experience means that we can deliver a higher quality product at a lower cost than the competition.

Dicing

Ion Beam Milling Inc.'s advanced dicing equipment uses a thin diamond blade mounted on a high speed air bearing spindle to dice an array of standard and exotic materials such as Alumina, BeO, Quartz, Aluminum Nitride, and Silicon of various thicknesses. Our state of the art dicing process insures burr and chip free cuts resulting in chip outs less than 0.0005 mil in size. We also offer trench cuts in substrates of various sizes and shapes for custom applications.

Testing and Measurement

Ion Beam Milling provides a broad scope of affordable testing, screening and measurement services, performed to MIL-STD 883 or customer specification. Wire bond strength, die shear strength and solderability testing are a natural step in line with our quality assurance program.

Ion Beam Milling is your leading source for laser diode submounts, attenuators, spiral inductors, custom thin film circuits, ion etching and photolithography.

If you would like a copy of our ISO Quality Manual please visit the Information Request page.